Invention Grant
US09456120B2 Focus height repeatability improvement in a machine vision inspection system
有权
机器视觉检测系统中的对焦高度重复性提高
- Patent Title: Focus height repeatability improvement in a machine vision inspection system
- Patent Title (中): 机器视觉检测系统中的对焦高度重复性提高
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Application No.: US13940224Application Date: 2013-07-11
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Publication No.: US09456120B2Publication Date: 2016-09-27
- Inventor: Mark Lawrence Delaney
- Applicant: Mitutoyo Corporation
- Applicant Address: JP Kawasaki-shi
- Assignee: Mitutoyo Corporation
- Current Assignee: Mitutoyo Corporation
- Current Assignee Address: JP Kawasaki-shi
- Agency: Christensen O'Connor Johnson Kindness PLLC
- Main IPC: H04N5/232
- IPC: H04N5/232

Abstract:
A method improves focus height repeatability in a machine vision inspection system. A region of interest is defined within a field of view imaged by a camera portion, wherein an aligned edge feature in the region of interest may introduce a focus height sensitivity that varies depending on the aligned edge feature offset relative to the image pixels. A first set of focus-determining operations determines a focus height for the region of interest, and comprise at least one of: (a) operations that reduce the sensitivity of the focus height determination to the offset of the aligned edge feature relative to the image pixels; and (b) operations that adjust the offset of the aligned edge feature relative to the image pixels according to a predetermined offset repeatability criteria, such that the image data used in the focus height determination fulfills the offset repeatability criteria.
Public/Granted literature
- US20150015696A1 Focus Height Repeatability Improvement in a Machine Vision Inspection System Public/Granted day:2015-01-15
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