Invention Grant
- Patent Title: Apparatus and method for adjusting beam pattern in communication system supporting beam division multiple access scheme
- Patent Title (中): 支持光束分割多址方案的通信系统中调整波束图案的装置和方法
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Application No.: US14701117Application Date: 2015-04-30
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Publication No.: US09461360B2Publication Date: 2016-10-04
- Inventor: Won-Seok Lee , Yong-Hoon Kim , Kyoung-Sub Oh , Jong-Won Yu , Sol-Ji Yoo
- Applicant: Samsung Electronics Co., Ltd. , Korea Advanced Institute Of Science and Technology
- Applicant Address: KR KR
- Assignee: Samsung Electronics Co., Ltd,Korea Advanced Institute of Science and Technology
- Current Assignee: Samsung Electronics Co., Ltd,Korea Advanced Institute of Science and Technology
- Current Assignee Address: KR KR
- Agency: The Farrell Law Firm, P.C.
- Priority: KR10-2014-0052744 20140430
- Main IPC: H04L27/00
- IPC: H04L27/00 ; H01Q3/24 ; H01Q3/34 ; H01Q3/28 ; H04L25/02 ; H04B7/04 ; H01Q1/12 ; H01Q1/24 ; H01Q3/26 ; H01Q21/06 ; H04B7/06 ; H04B17/12
Abstract:
A method for adjusting a beam pattern in a beam pattern adjusting apparatus in a communication system supporting a Beam Division Multiple Access (BDMA) scheme is provided. The method includes determining whether a Voltage Standing Wave Ratio (VSWR) value for each antenna included in an antenna array included in the beam pattern adjusting apparatus is greater than or equal to a threshold VSWR value, if it is determined that an antenna of the antenna array has a VSWR value that is greater than or equal to the threshold VSWR, detecting whether each of the antenna elements is operable, and if it is determined that at least one of the antennas is inoperable, adjusting a beam pattern of at least one of the antennas that is operable.
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