发明授权
- 专利标题: Method for producing a film element
- 专利标题(中): 薄膜元件的制造方法
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申请号: US14224737申请日: 2014-03-25
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公开(公告)号: US09463659B2公开(公告)日: 2016-10-11
- 发明人: Ludwig Brehm , Haymo Katschorek , Norbert Laus
- 申请人: Ludwig Brehm , Haymo Katschorek , Norbert Laus
- 申请人地址: DE Furth
- 专利权人: LEONHARD KURZ STIFTUNG & CO. KG
- 当前专利权人: LEONHARD KURZ STIFTUNG & CO. KG
- 当前专利权人地址: DE Furth
- 代理机构: Hoffmann & Baron, LLP
- 优先权: DE102008013073 20080306
- 主分类号: B42D25/445
- IPC分类号: B42D25/445 ; B42D25/337 ; B42D25/373 ; B42D25/41 ; B42D25/42 ; B42D25/29 ; B42D25/45 ; B42D25/351 ; B42D25/328 ; B42D25/346
摘要:
The invention concerns a process for producing a film element having mutually registered metallic layers (11, 16) and a film element which can be produced by such a process. A first metallic layer (11) provided on a first surface of a flexible single-layer or multi-layer carrier film (10) and a masking layer (13) provided on the second surface of the carrier film (10), opposite to the first surface, are structured in accurate register relationship with each other by means of mutually synchronized structuring procedures. After structuring of the first metallic layer (11) and the masking layer (13) one or more further layers are applied to the first metallic layer (11). Applied to the one or more further layers (15) is a second metallic layer (16) to which a first photoactivatable layer (17) is applied. The first photoactivatable layer (17) is structured by means of trans-exposure through the masking layer (13), the first metallic layer, the one or more further layers and the second metallic layer (16) from the side of the masking layer (13) by means of electromagnetic radiation of a wavelength to which the first photoactivatable layer (17) is sensitive, or the first photoactivatable layer is exposed controlledly through the masking layer from the side of the film body that is opposite to the masking layer.
公开/授权文献
- US20140205852A1 Method for Producing a Film Element 公开/授权日:2014-07-24