Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US14580651Application Date: 2014-12-23
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Publication No.: US09472678B2Publication Date: 2016-10-18
- Inventor: Shunpei Yamazaki , Tetsuhiro Tanaka , Hideomi Suzawa , Yasumasa Yamane , Yuhei Sato , Sachiaki Tezuka
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2013-270926 20131227
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/16 ; H01L27/088 ; H01L27/06

Abstract:
To provide a transistor with stable electrical characteristics, a transistor with a low off-state current, a transistor with a high on-state current, a semiconductor device including the transistor, or a durable semiconductor device. The semiconductor device includes a first transistor using silicon, an aluminum oxide film over the first transistor, and a second transistor using an oxide semiconductor over the aluminum oxide film. The oxide semiconductor has a lower hydrogen concentration than silicon.
Public/Granted literature
- US09343581B2 Semiconductor device Public/Granted day:2016-05-17
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