The present invention provides a substrate delivery device and a strong acid or strong base etching adequate for a wet process. The substrate delivery device comprises: a plurality of first delivery rollers (2) parallel to one another in an etching chamber (1), a plurality of second delivery rollers (4) parallel to one another in a cleaning chamber (3) and a carrier (5) employed for carrying a substrate (100); the carrier (5) comprises two first side frames (51) located along a direction of delivering the substrate (100), two second side frames (53) connected to ends of the two first side frames (51), a plurality of first and second connection parts (55, 57) which are intercrossing and orthogonal in an area surrounded by the two first side frames (51) and the two second side frames (53) and a plurality of supports (59) at joins of the plurality of first and second connection parts (55, 57); the plurality of first and second connection parts (55, 57) are intercrossing and orthogonal with one another to form a plurality of hollow parts (52); the substrate (100) is located on the carrier (5).