Invention Grant
- Patent Title: Silica containing basic sorbent for acid gas removal
- Patent Title (中): 含二氧化硅的碱性吸附剂用于除去酸性气体
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Application No.: US14986883Application Date: 2016-01-04
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Publication No.: US09475030B2Publication Date: 2016-10-25
- Inventor: Ian Saratovsky , Tommy Hung-Ting Chen , Nicholas S. Ergang , Lewis B. Benson
- Applicant: Ecolab USA Inc.
- Applicant Address: US IL Naperville
- Assignee: Ecolab USA Inc.
- Current Assignee: Ecolab USA Inc.
- Current Assignee Address: US IL Naperville
- Agency: Leydig, Voit & Mayer, Ltd.
- Main IPC: B01D53/02
- IPC: B01D53/02 ; B01J20/10 ; B01J20/22 ; B01D53/50 ; B01D53/68 ; B01J20/04 ; B01J20/06 ; B01J20/18 ; B01J20/20 ; B01J20/30 ; B01J20/02 ; B01J20/28

Abstract:
An acid gas sorbent composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yF.B wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, or an amine-containing organosilane; and wherein B is a hygroscopic solid at a preferred water to solid molar ration of about 0.1 to about 6, and more particularly, B is a basic inorganic solid including, but not limiting to, alkali to alkali-earth metal oxides, hydroxides, carbonates, or bicarbonates, containing at least one of the following metal cations: calcium, magnesium, strontium, barium, sodium, lithium, potassium, cesium, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, dysprosium, scandium, ytterbium, yttrium, or erbrium; wherein the molar ration of y/x is equal to about 0.01 to about 0.5.
Public/Granted literature
- US20160114306A1 Silica Containing Basic Sorbent for Acid Gas Removal Public/Granted day:2016-04-28
Information query
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