Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
-
Application No.: US13951222Application Date: 2013-07-25
-
Publication No.: US09477159B2Publication Date: 2016-10-25
- Inventor: Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03F7/20

Abstract:
In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.
Public/Granted literature
- US20130308110A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2013-11-21
Information query