Invention Grant
- Patent Title: Integrated gas discharge tube and preparation method therefor
- Patent Title (中): 集成气体放电管及其制备方法
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Application No.: US14779082Application Date: 2014-02-13
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Publication No.: US09478386B2Publication Date: 2016-10-25
- Inventor: Meng Fu
- Applicant: Shenzhen Bencent Electronics Co., Ltd.
- Applicant Address: CN
- Assignee: Shenzhen Bencent Electronics Co., Ltd.
- Current Assignee: Shenzhen Bencent Electronics Co., Ltd.
- Current Assignee Address: CN
- Agency: TechLaw Ventures, PLLC
- Agent Terrance J. Edwards
- Priority: CN201310095077 20130322
- International Application: PCT/CN2014/072010 WO 20140213
- International Announcement: WO2014/146523 WO 20140925
- Main IPC: H01J17/49
- IPC: H01J17/49 ; H01J17/04 ; H01J19/02 ; H01J19/28 ; H01J19/54 ; H01J21/00 ; H01J21/36 ; H01J9/02 ; H01J9/26 ; H01J17/18

Abstract:
Provided is an integrated gas discharge tube. In the integrated gas discharge tube, the structure of the gas discharge tube is regulated into an upper cover and an insulative base, and the internal side surface and the external side surface of the bottom surface of the insulative base are respectively subject to electrode integration, so that the discharge effect of the gas discharge tube is effectively increased and the preparation process and the preparation flow of a multi-terminal-to-ground gas discharge tube are greatly simplified so as to greatly simplify the preparation process and to realize batch production and high integration of the gas discharge tube. Also provided is a preparation method for an integrated gas discharge tube.
Public/Granted literature
- US20160049276A1 INTEGRATED GAS DISCHARGE TUBE AND PREPARATION METHOD THEREFOR Public/Granted day:2016-02-18
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