Invention Grant
- Patent Title: Charged particle beam apparatus and trajectory correction method in charged particle beam apparatus
- Patent Title (中): 带电粒子束装置中的带电粒子束装置和轨迹校正方法
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Application No.: US14760053Application Date: 2014-01-21
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Publication No.: US09484181B2Publication Date: 2016-11-01
- Inventor: Hideto Dohi , Akira Ikegami , Hideyuki Kazumi
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2013-011241 20130124
- International Application: PCT/JP2014/051070 WO 20140121
- International Announcement: WO2014/115708 WO 20140731
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/153 ; H01J37/28 ; H01J37/22
Abstract:
There is provided a charged particle beam apparatus that includes a trajectory monitoring unit which is disposed above an objective lens (14) and which includes an optical element (12) having a lens action and a trajectory correcting deflector (10). An applied voltage and an excitation current of the optical element (12) are set to zero after a trajectory correction of a primary charged particle beam (30). Accordingly, the lens action and an aberration of the optical element (12) have no influence on resolution.
Public/Granted literature
- US20150357155A1 Charged Particle Beam Apparatus and Trajectory Correction Method in Charged Particle Beam Apparatus Public/Granted day:2015-12-10
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