Invention Grant
- Patent Title: Imaging apparatus and exposure determining method
- Patent Title (中): 成像设备和曝光确定方法
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Application No.: US14716536Application Date: 2015-05-19
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Publication No.: US09485408B2Publication Date: 2016-11-01
- Inventor: Kazuki Inoue , Yoichi Iwasaki , Takashi Aoki
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2012-254317 20121120
- Main IPC: H04N5/235
- IPC: H04N5/235 ; G02B13/00 ; G02B7/34 ; H04N5/232 ; G03B13/36 ; H04N5/369 ; H04N9/77

Abstract:
It is intended to provide an imaging apparatus that enables proper exposure of phase difference detection pixels and thereby makes it possible to perform phase difference autofocusing with high accuracy. A system control unit 11 selects phase difference detection pixels from phase difference detection pixels 51R and 51L existing in a selected phase difference detection area 52 according to a position of the selected phase difference detection area 52 in a row direction X, and determines exposure conditions based on output signals of the selected phase difference detection pixels. A defocus amount calculation unit 19 calculates a defocus amount using output signals of the phase difference detection pixels 51R and 51L existing in the selected phase difference detection area 52 that are part of a shot image signal produced by shooting that is performed by an imaging device 5 under the exposure conditions determined by the exposure determining unit 11.
Public/Granted literature
- US20150256738A1 IMAGING APPARATUS AND EXPOSURE DETERMINING METHOD Public/Granted day:2015-09-10
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