Invention Grant
- Patent Title: Package substrate having photo-sensitive dielectric layer and method of fabricating the same
- Patent Title (中): 具有光敏介电层的封装基板及其制造方法
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Application No.: US14010250Application Date: 2013-08-26
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Publication No.: US09485874B2Publication Date: 2016-11-01
- Inventor: Yu-Hua Chen , Wei-Chung Lo , Dyi-Chung Hu , Chang-Hong Hsieh
- Applicant: Industrial Technology Research Institute , Unimicron Technology Corporation
- Applicant Address: TW Hsinchu TW Taoyuan
- Assignee: Industrial Technology Research Institute,Unimicron Technology Corp.
- Current Assignee: Industrial Technology Research Institute,Unimicron Technology Corp.
- Current Assignee Address: TW Hsinchu TW Taoyuan
- Agency: Jianq Chyun IP Office
- Priority: TW101137406A 20121011
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H05K3/40 ; H01L23/14 ; H01L23/498

Abstract:
A package substrate and a method of fabricating the package substrate are provided. The package substrate may include an interposer having at least one conductive through via, a photo-sensitive dielectric layer formed on one side of the interposer, and at least one conductive via formed in the photo-sensitive dielectric layer and electrically connected to the conductive through via. By means of a photo lithography process with high alignment accuracy, at least one via with an extremely small diameter can be formed on the photo-sensitive dielectric layer and align with the conductive through via. Therefore, the conductive through via can have its diameter reduced as required, without considering the alignment with the at least one via. Accordingly, the interconnection density of the conductive through via on the interposer is increased.
Public/Granted literature
- US20140102777A1 PACKAGE SUBSTRATE AND METHOD OF FABRICATING THE SAME Public/Granted day:2014-04-17
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