Invention Grant
US09488315B2 Gas distribution apparatus for directional and proportional delivery of process gas to a process chamber
有权
用于将处理气体定向和比例地输送到处理室的气体分配装置
- Patent Title: Gas distribution apparatus for directional and proportional delivery of process gas to a process chamber
- Patent Title (中): 用于将处理气体定向和比例地输送到处理室的气体分配装置
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Application No.: US14207475Application Date: 2014-03-12
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Publication No.: US09488315B2Publication Date: 2016-11-08
- Inventor: Roy C. Nangoy , Saravjeet Singh
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: F16K11/20
- IPC: F16K11/20 ; F17D1/00

Abstract:
In some embodiments, a gas distribution apparatus may include: a manifold having a gas inlet to receive a process gas from a fast gas exchange unit and a first gas outlet to provide the process gas to a first gas delivery zone; a plurality of flow restrictors fluidly coupled to one another in parallel and to the gas inlet, wherein each of the plurality of flow restrictors are configured to allow at least a portion of a total flow of a process gas through each of the plurality of flow restrictors; and a plurality of valves each coupled to respective ones of the plurality of flow restrictors, wherein the plurality of valves are configured to be selectively opened to allow the process gas to flow through selective ones of the plurality of flow restrictors to provide a desired percentage of a total flow of the process gas to the outlet.
Public/Granted literature
- US20140261805A1 GAS DISTRIBUTION APPARATUS FOR DIRECTIONAL AND PROPORTIONAL DELIVERY OF PROCESS GAS TO A PROCESS CHAMBER Public/Granted day:2014-09-18
Information query