Invention Grant
- Patent Title: Display device and manufacturing method for same
- Patent Title (中): 显示装置及其制造方法相同
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Application No.: US13915671Application Date: 2013-06-12
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Publication No.: US09496292B2Publication Date: 2016-11-15
- Inventor: Hidekazu Miyake , Norihiro Uemura , Takeshi Noda , Isao Suzumura , Toshiki Kaneko
- Applicant: Japan Display Inc.
- Applicant Address: JP Tokyo
- Assignee: Japan Display Inc.
- Current Assignee: Japan Display Inc.
- Current Assignee Address: JP Tokyo
- Agency: Typha IP LLC
- Priority: JP2012-134740 20120614
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L27/32

Abstract:
The present invention provides a display device having: gate electrodes formed on a transparent substrate; a gate insulating film for covering the gate electrodes; an oxide semiconductor formed on the gate insulating film; drain electrodes and source electrodes formed at a distance from each other with channel regions of the oxide semiconductor in between; an interlayer capacitor film for covering the drain electrodes and source electrodes; common electrodes formed on top of the interlayer capacitor film; and pixel electrodes formed so as to face the common electrodes, and wherein an etching stopper layer for covering the channel regions is formed between the oxide semiconductor and the drain electrodes and source electrodes, the drain electrodes are a multilayer film where a transparent conductive film and a metal film are layered on top of each other, and the drain electrodes and source electrodes make direct contact with the oxide semiconductor.
Public/Granted literature
- US20130334524A1 DISPLAY DEVICE AND MANUFACTURING METHOD FOR SAME Public/Granted day:2013-12-19
Information query
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