Invention Grant
US09506965B2 Alternately arranged overlay marks having asymmetric spacing and measurement thereof
有权
具有不对称间隔和其测量的交替布置的覆盖标记
- Patent Title: Alternately arranged overlay marks having asymmetric spacing and measurement thereof
- Patent Title (中): 具有不对称间隔和其测量的交替布置的覆盖标记
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Application No.: US13674704Application Date: 2012-11-12
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Publication No.: US09506965B2Publication Date: 2016-11-29
- Inventor: Kuo-Chun Huang , Chien-Hao Chen , Wen-Liang Huang
- Applicant: United Microelectronics Corp.
- Applicant Address: TW Hsinchu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Hsinchu
- Agency: J.C. Patents
- Main IPC: G03F1/42
- IPC: G03F1/42 ; G03F1/38 ; G01R27/26 ; G01R27/02 ; G03F7/20
Abstract:
An overlay mark including at least one first overlay mark and at least one second overlay mark is provided. The first overlay mark includes a plurality of first bars and a plurality of first spaces arranged alternately, and the first spaces are not constant. The second overlay mark includes a plurality of second bars and a plurality of second spaces arranged alternately, and the second spaces are constant. Besides, the second overlay mark partially overlaps with the first overlay mark.
Public/Granted literature
- US20140132283A1 OVERLAY MARK AND MEASUREMENT METHOD THEREOF Public/Granted day:2014-05-15
Information query
