发明授权
US09506965B2 Alternately arranged overlay marks having asymmetric spacing and measurement thereof
有权
具有不对称间隔和其测量的交替布置的覆盖标记
- 专利标题： Alternately arranged overlay marks having asymmetric spacing and measurement thereof
- 专利标题（中）： 具有不对称间隔和其测量的交替布置的覆盖标记
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申请号： US13674704申请日： 2012-11-12
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公开(公告)号： US09506965B2公开(公告)日： 2016-11-29
- 发明人: Kuo-Chun Huang , Chien-Hao Chen , Wen-Liang Huang
- 申请人： United Microelectronics Corp.
- 申请人地址： TW Hsinchu
- 专利权人： United Microelectronics Corp.
- 当前专利权人： United Microelectronics Corp.
- 当前专利权人地址： TW Hsinchu
- 代理机构： J.C. Patents
- 主分类号： G03F1/42
- IPC分类号： G03F1/42 ; G03F1/38 ; G01R27/26 ; G01R27/02 ; G03F7/20
摘要：
An overlay mark including at least one first overlay mark and at least one second overlay mark is provided. The first overlay mark includes a plurality of first bars and a plurality of first spaces arranged alternately, and the first spaces are not constant. The second overlay mark includes a plurality of second bars and a plurality of second spaces arranged alternately, and the second spaces are constant. Besides, the second overlay mark partially overlaps with the first overlay mark.
公开/授权文献
- US20140132283A1 OVERLAY MARK AND MEASUREMENT METHOD THEREOF 公开/授权日：2014-05-15
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