Invention Grant
- Patent Title: Network architecture and protocol for cluster of lithography machines
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Application No.: US14738962Application Date: 2015-06-15
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Publication No.: US09507629B2Publication Date: 2016-11-29
- Inventor: Marcel Nicolaas Jacobus Van Kervinck , Guido De Boer
- Applicant: MAPPER LITHOGRAPHY IP B.V.
- Applicant Address: NL Delft
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Monegier LLP
- Agent David P. Owen
- Main IPC: G06F9/46
- IPC: G06F9/46 ; G06F19/00 ; G06F9/48 ; G03F7/20 ; H01J37/317 ; B82Y10/00 ; B82Y40/00 ; G05B19/418

Abstract:
A lithography system having one or more lithography elements Each lithography element has a plurality of lithography subsystems. The lithography system further has a control network forming a control network path between the plurality of the lithography subsystems and at least one element control unit for communication of control information. The lithography system is arranged for: issuing control information to the at least one element control unit to control operation of one or more of the lithography subsystems for exposure of one or more wafers; issuing a process program to the element control unit. The process program has a set of predefined commands and associated parameters. The element control unit is arranged to transmit a command of the process program to a lithography subsystem to be executed by the lithography subsystem, regardless of an execution status of a preceding command transmitted to the lithography subsystem.
Public/Granted literature
- US20150309424A1 Network architecture and protocol for cluster of lithography machines Public/Granted day:2015-10-29
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