Invention Grant
- Patent Title: CW DUV laser with improved stability
- Patent Title (中): CW DUV激光器具有改进的稳定性
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Application No.: US14294019Application Date: 2014-06-02
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Publication No.: US09509112B2Publication Date: 2016-11-29
- Inventor: Yung-Ho Chuang , Xiaoxu Lu , John Fielden
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Bever, Hoffman & Harms, LLP
- Main IPC: H01S3/109
- IPC: H01S3/109 ; H01S3/00 ; G02F1/355 ; G02F1/35

Abstract:
A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more periodically poled non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and one of a fourth harmonic generator module and a fifth harmonic generator. The fourth harmonic generator module includes a cavity resonant at the fundamental frequency configured to combine the fundamental frequency with the third harmonic to generate a fourth harmonic. The fourth harmonic generator module includes either a cavity resonant at the fundamental frequency for combining the fundamental frequency with the third harmonic to generate a fifth harmonic, or a cavity resonant at the second harmonic frequency for combining the second harmonic and the third harmonic to generate the fifth harmonic.
Public/Granted literature
- US20140362880A1 CW DUV Laser With Improved Stability Public/Granted day:2014-12-11
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