Invention Grant
- Patent Title: Exposure apparatus and exposure method
- Patent Title (中): 曝光装置和曝光方法
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Application No.: US14363489Application Date: 2012-12-04
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Publication No.: US09513567B2Publication Date: 2016-12-06
- Inventor: Shiro Hara , Sommawan Khumpuang , Yoshiki Inuzuka , Yasuaki Yokoyama
- Applicant: National Institute of Advanced Industrial Science and Technology
- Applicant Address: JP Tokyo
- Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2011-267030 20111206
- International Application: PCT/JP2012/081413 WO 20121204
- International Announcement: WO2013/084898 WO 20130613
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; H01L21/677
Abstract:
To provide a mask aligner that can appropriately manage very small-quantity production and multiproduct production. The present invention is a mask aligner 1 that exposes a wafer W in a predetermined size through a mask M, and has a configuration that includes: a conveying device 5 for conveying the wafer W and the mask M; an exposure stage 3f on which the wafer W conveyed by the conveying device 5 is installed; a mask holder 3b that is mounted to face the exposure stage 3f and on which the mask M conveyed by the conveying device 5 is installed; and an LED light source 8c mounted to face the exposure stage 3f via the mask holder 3b.
Public/Granted literature
- US20140320840A1 Exposure Apparatus and Exposure Method Public/Granted day:2014-10-30
Information query
