Invention Grant
- Patent Title: R-T-B based sintered magnet
- Patent Title (中): R-T-B系烧结磁体
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Application No.: US14378432Application Date: 2013-02-13
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Publication No.: US09514869B2Publication Date: 2016-12-06
- Inventor: Masashi Miwa , Haruna Nakajima , Ken-ichi Nishikawa , Tetsuya Hidaka , Jun Hagiwara , Chikara Ishizaka
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-028960 20120213; JP2012-079608 20120330
- International Application: PCT/JP2013/054065 WO 20130213
- International Announcement: WO2013/122256 WO 20130822
- Main IPC: H01F1/057
- IPC: H01F1/057 ; C22C38/00 ; C22C38/06 ; C22C38/10 ; C22C38/14 ; C22C38/16 ; H01F7/02 ; B22F3/10

Abstract:
The present invention provides an R-T-B based sintered magnet including R2T14B crystal grains wherein; a grain boundary is formed by two or more adjacent R2T14B crystal grains, an R—O—C concentrated part, in which concentrations of R, O and C are higher than those in the R2T14B crystal grains respectively, is in the grain boundary, and an area of the R—O—C concentrated part occupying in that of the grain boundary on a cut surface of the R-T-B based sintered magnet is within a range of 10% or more to 75% or less.
Public/Granted literature
- US20150155083A1 R-T-B BASED SINTERED MAGNET Public/Granted day:2015-06-04
Information query
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