Invention Grant
- Patent Title: Package structure and fabrication method thereof
- Patent Title (中): 封装结构及其制造方法
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Application No.: US14736436Application Date: 2015-06-11
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Publication No.: US09515040B2Publication Date: 2016-12-06
- Inventor: Yan-Heng Chen , Mu-Hsuan Chan , Chieh-Yuan Chi , Chun-Tang Lin
- Applicant: Siliconware Precision Industries Co., Ltd.
- Applicant Address: TW Taichung
- Assignee: Siliconware Precision Industries Co., Ltd.
- Current Assignee: Siliconware Precision Industries Co., Ltd.
- Current Assignee Address: TW Taichung
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless; Steven M. Jensen
- Priority: TW103123900A 20140711
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/56 ; H01L25/10

Abstract:
A method for fabricating a package structure is provided, including the steps of: sequentially forming a metal layer and a dielectric layer on a first carrier, wherein the dielectric layer has a plurality of openings exposing portions of the metal layer; disposing an electronic element on the dielectric layer via an active surface thereof and mounting a plurality of conductive elements of metal balls on the exposed portions of the metal layer; forming an encapsulant on the dielectric layer for encapsulating the electronic element and the conductive elements; removing the first carrier; and patterning the metal layer into first circuits and forming second circuits on the dielectric layer, wherein the second circuits are electrically connected to the electronic element and the first circuits. The invention dispenses with the conventional laser ablation process so as to simplify the fabrication process, save the fabrication cost and increase the product reliability.
Public/Granted literature
- US20160013146A1 PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF Public/Granted day:2016-01-14
Information query
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