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发明授权
US09515296B2 Deposition device including laser mask and deposition method using the same 有权
包括激光掩模和沉积方法的沉积装置

Deposition device including laser mask and deposition method using the same
摘要：
A deposition device including a chamber configured to accommodate a substrate supported on a stage, a deposition source configured to discharge material toward the substrate, and a laser mask system configured to form a laser mask between the substrate and the stage.
摘要（中）：

一种沉积装置，包括被配置为容纳支撑在载物台上的基底的腔室，被配置为朝向基底排出材料的沉积源，以及被配置为在基底和载物台之间形成激光掩模的激光掩模系统。

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