Invention Grant
- Patent Title: Substrate transfer antechamber mechanism
- Patent Title (中): 基材转移前处理机制
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Application No.: US14647685Application Date: 2013-10-29
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Publication No.: US09524895B2Publication Date: 2016-12-20
- Inventor: Shiro Hara , Hitoshi Maekawa
- Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Applicant Address: JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Tokyo
- Agency: Staas & Halsey LLP
- Priority: JP2012-265071 20121204
- International Application: PCT/JP2013/079225 WO 20131029
- International Announcement: WO2014/087760 WO 20140612
- Main IPC: H01L21/677
- IPC: H01L21/677 ; B25J18/02 ; B25J9/00

Abstract:
There is provided a substrate transfer antechamber mechanism for a compact manufacturing apparatus that produces various types of devices in small volume using a small-diameter processing substrate at low cost. A container placement table, on which a wafer transfer container housing a semiconductor wafer is placed, is provided on an upper surface of an apparatus antechamber for a compact semiconductor manufacturing apparatus, and the apparatus antechamber includes therein a wafer elevating mechanism and a horizontal transfer mechanism. The wafer elevating mechanism moves down while holding from below a delivery bottom of the wafer transfer container, on which the semiconductor wafer remains placed, to transfer the semiconductor wafer into the apparatus antechamber. The horizontal transfer mechanism transfers the semiconductor wafer into a processing chamber using a transfer arm that receives the semiconductor wafer from the delivery bottom and extends.
Public/Granted literature
- US20150311101A1 SUBSTRATE TRANSFER ANTECHAMBER MECHANISM Public/Granted day:2015-10-29
Information query
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