Invention Grant
- Patent Title: Mask plate
- Patent Title (中): 面膜
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Application No.: US14395711Application Date: 2012-12-04
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Publication No.: US09529252B2Publication Date: 2016-12-27
- Inventor: Zhenyu Xie , Jian Guo
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN201210226736 20120629
- International Application: PCT/CN2012/085860 WO 20121204
- International Announcement: WO2014/000380 WO 20140103
- Main IPC: G03F1/50
- IPC: G03F1/50 ; G03F1/00 ; G02B27/09
Abstract:
A mask plate is used for implementing a graphic structure with a narrower line width on a target substrate. The mask plate includes a slit-shaped photic area and a lightproof area. An edge of the slit-shaped photic area is in a curve shape.
Public/Granted literature
- US20150079503A1 MASK PLATE Public/Granted day:2015-03-19
Information query
