Invention Grant
- Patent Title: Polishing composition and method for nickel-phosphorous coated memory disks
- Patent Title (中): 镍磷涂层记录盘的抛光组合物和方法
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Application No.: US14515723Application Date: 2014-10-16
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Publication No.: US09534147B2Publication Date: 2017-01-03
- Inventor: Hon Wu Lau , Selvaraj Palanisamy Chinnathambi , Ke Zhang
- Applicant: Cabot Microelectronics Corporation
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas Omholt
- Main IPC: C09G1/02
- IPC: C09G1/02 ; B24B37/04 ; H01L21/306 ; G11B5/84
Abstract:
The invention provides a polishing composition that contains (a) α-alumina particles that have an average particle size of about 250 nm to about 300 nm, (b) a per-type oxidizing agent, (c) a complexing agent, wherein the complexing agent is an amino acid or an organic acid, and (d) water. The invention also provides a method of polishing a substrate, especially a nickel-phosphorous substrate, with the polishing composition.
Public/Granted literature
- US20150114929A1 POLISHING COMPOSITION AND METHOD FOR NICKEL-PHOSPHOROUS COATED MEMORY DISKS Public/Granted day:2015-04-30
Information query
