Invention Grant
- Patent Title: Collimator for use in substrate processing chambers
- Patent Title (中): 用于基板处理室的准直器
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Application No.: US14607273Application Date: 2015-01-28
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Publication No.: US09543126B2Publication Date: 2017-01-10
- Inventor: Martin Lee Riker
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01J37/34 ; C23C14/04

Abstract:
Embodiments of collimators for use in substrate processing chambers are provided herein. In some embodiments, a collimator includes: a body having a central region, a peripheral region, and a transitional region disposed between the central and peripheral regions; a first plurality of apertures in the central region having a first aspect ratio; a second plurality of apertures in the peripheral region having a second aspect ratio less than the first aspect ratio; and a third plurality of apertures in the transitional region, wherein the third plurality of apertures are cut so the transitional region forms a conical shape surrounding the central region.
Public/Granted literature
- US20160145735A1 COLLIMATOR FOR USE IN SUBSTRATE PROCESSING CHAMBERS Public/Granted day:2016-05-26
Information query
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