Invention Grant
- Patent Title: Cross section processing method and cross section processing apparatus
- Patent Title (中): 截面加工方法及截面加工装置
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Application No.: US14520595Application Date: 2014-10-22
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Publication No.: US09548185B2Publication Date: 2017-01-17
- Inventor: Hidekazu Suzuki , Tatsuya Asahata , Atsushi Uemoto
- Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
- Applicant Address: JP
- Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2013-221552 20131024; JP2014-209269 20141010
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J37/305 ; G01N1/32 ; H01J37/304

Abstract:
A cross section processing method and a cross section processing apparatus are provided in which it is possible to form a flat cross section in a sample composed of a plurality of substances having different hardness by a focused ion beam. The etching of a processing area is performed while variably controlling the irradiation interval, the irradiation time, or the like of a focused ion beam based on cross section information of an SEM image obtained by the observation of a cross section. In this way, even if a sample is composed of a plurality of substances having different hardness, it is possible to form a flat observation surface with a uniform etching rate.
Public/Granted literature
- US20150115156A1 CROSS SECTION PROCESSING METHOD AND CROSS SECTION PROCESSING APPARATUS Public/Granted day:2015-04-30
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