Invention Grant
- Patent Title: Reducing noise in spectral data from polishing substrates
- Patent Title (中): 从抛光基板减少光谱数据中的噪声
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Application No.: US14063917Application Date: 2013-10-25
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Publication No.: US09551567B2Publication Date: 2017-01-24
- Inventor: Jeffrey Drue David , Boguslaw A. Swedek , Benjamin Cherian
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: G01B5/02
- IPC: G01B5/02 ; B24B49/00 ; G01B11/06 ; B24B37/013 ; B24B49/12 ; H01L21/66
Abstract:
Among other things, a machine based method includes representing a plurality of spectra reflected from one or more substrates at a plurality of different positions on the one or more substrates in the form of a first matrix; decomposing, by one or more computers, the first matrix into products of at least two component matrixes of a first set of component matrixes; reducing dimensions of each of the at least two component matrixes to produce a second set of component matrixes containing the at least two matrixes with reduced dimensions; and generating, by the one or more computers, a second matrix by taking a product of the matrixes of the second set of component matrixes.
Public/Granted literature
- US20150120243A1 REDUCING NOISE IN SPECTRAL DATA FROM POLISHING SUBSTRATES Public/Granted day:2015-04-30
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