Invention Grant
- Patent Title: Field emission cathode and field emission device
- Patent Title (中): 场发射阴极和场发射装置
-
Application No.: US14753380Application Date: 2015-06-29
-
Publication No.: US09552953B2Publication Date: 2017-01-24
- Inventor: Bing-Chu Du , Peng Liu , Duan-Liang Zhou , Chun-Hai Zhang , Shou-Shan Fan
- Applicant: Tsinghua University , HON HAI PRECISION INDUSTRY CO., LTD.
- Applicant Address: CN Beijing TW New Taipei
- Assignee: Tsinghua University,HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee: Tsinghua University,HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee Address: CN Beijing TW New Taipei
- Agent Zhigang Ma
- Priority: CN201410327705 20140710
- Main IPC: H01J1/304
- IPC: H01J1/304 ; H01J3/02 ; H01J9/02

Abstract:
The disclosure relates to a field emission cathode. The field emission cathode includes a microchannel plate, a cathode electrode and a number of cathode emitters. The microchannel plate is an insulative plate and includes a first surface and a second surface opposite to the first surface. The microchannel plate defines a number of holes extending through the microchannel plate from the first surface to the second surface. The cathode electrode is located on the first surface. The number of cathode emitters are filled in the number of holes and electrically connected with the cathode electrode.
Public/Granted literature
- US20160013005A1 FIELD EMISSION CATHODE AND FIELD EMISSION DEVICE Public/Granted day:2016-01-14
Information query