发明授权
- 专利标题: Gate stack for normally-off compound semiconductor transistor
- 专利标题(中): 用于常闭复合半导体晶体管的栅极堆叠
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申请号: US13921630申请日: 2013-06-19
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公开(公告)号: US09553183B2公开(公告)日: 2017-01-24
- 发明人: Gilberto Curatola
- 申请人: Infineon Technologies Austria AG
- 申请人地址: AT Villach
- 专利权人: Infineon Technologies Austria AG
- 当前专利权人: Infineon Technologies Austria AG
- 当前专利权人地址: AT Villach
- 代理机构: Murphy, Bilak & Homiller, PLLC
- 主分类号: H01L29/778
- IPC分类号: H01L29/778 ; H01L29/20 ; H01L29/205 ; H01L29/66
摘要:
A normally-off compound semiconductor transistor includes a heterostructure body and a gate stack on the heterostructure body. The heterostructure body includes a source, a drain spaced apart from the source, and a channel for connecting the source and the drain. The channel includes a first two-dimensional charge carrier gas of a first polarity arising in the heterostructure body due to piezoelectric effects. The gate stack controls the channel in a region of the heterostructure body under the gate stack. The gate stack includes at least one III-nitride material which gives rise to a second two-dimensional charge carrier gas of a second polarity opposite the first polarity in the gate stack or in the heterostructure body under the gate stack due to piezoelectric effects. The second two-dimensional charge carrier gas counter-balances polarization charges in the first two-dimensional charge carrier gas so that the channel is disrupted under the gate stack.
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