Invention Grant
- Patent Title: Multi charged particle beam writing method and multi charged particle beam writing apparatus
- Patent Title (中): 多带电粒子束写入方法和多带电粒子束写入装置
-
Application No.: US14885726Application Date: 2015-10-16
-
Publication No.: US09570267B2Publication Date: 2017-02-14
- Inventor: Hiroshi Matsumoto , Tomohiro Iijima , Munehiro Ogasawara , Hideo Inoue , Ryoichi Yoshikawa
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-242644 20121102; JP2013-124435 20130613
- Main IPC: A61N5/00
- IPC: A61N5/00 ; H01J37/04 ; H01J37/317

Abstract:
A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.
Public/Granted literature
- US20160042908A1 MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS Public/Granted day:2016-02-11
Information query