Invention Grant
- Patent Title: Upper-layer cleaning device for water treatment device, and method for cleaning water treatment device filter layer
- Patent Title (中): 水处理装置上层清洗装置及清洗水处理装置过滤层的方法
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Application No.: US14234966Application Date: 2012-07-05
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Publication No.: US09573082B2Publication Date: 2017-02-21
- Inventor: Hitoshi Mimura , Tadao Oiwa , Hui Lang Cai
- Applicant: Hitoshi Mimura , Tadao Oiwa , Hui Lang Cai
- Applicant Address: JP Osaka
- Assignee: NAGAOKA INTERNATIONAL CORPORATION
- Current Assignee: NAGAOKA INTERNATIONAL CORPORATION
- Current Assignee Address: JP Osaka
- Agency: Florek & Endres PLLC
- Priority: JP2011-161980 20110725
- International Application: PCT/JP2012/067146 WO 20120705
- International Announcement: WO2013/015090 WO 20130131
- Main IPC: B01D24/46
- IPC: B01D24/46 ; C02F1/64 ; C02F3/34 ; C02F3/06 ; C02F1/74 ; C02F103/06 ; C02F1/28 ; C02F101/20

Abstract:
Water treatment apparatus includes raw water special air mixing nozzles (7); filtering tank (5) housing filter layer (4) including two layers of upper layer (2) and lower layer (3), the upper layer including a filter medium with a smaller specific gravity and a larger particle size than a filter medium of the lower layer; a water collection pipe (13) removing filtered water and supplying reverse cleaning water to the filter layer during reverse cleaning; drainage trough (12); and upper layer cleaning apparatus (10), in which the upper layer cleaning apparatus includes upper layer cleaning pipe support member (17), upper layer cleaning water pipe (18), surface-cleaning special air mixing nozzles (19), air suction pipe (20), and horizontal air pipes (31 and 32) and the raw water special air mixing nozzles (7) are attached to raw water inflow tank (70) provided on a part of the drainage trough (12).
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