发明授权
- 专利标题: Circuit board structure and method for manufacturing the same
- 专利标题(中): 电路板结构及其制造方法
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申请号: US14821819申请日: 2015-08-10
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公开(公告)号: US09578742B1公开(公告)日: 2017-02-21
- 发明人: Shih-Liang Cheng , Dyi-Chung Hu , Yu-Hua Chen
- 申请人: Unimicron Technology Corp.
- 申请人地址: TW Taoyuan
- 专利权人: UNIMICRON TECHNOLOGY CORP.
- 当前专利权人: UNIMICRON TECHNOLOGY CORP.
- 当前专利权人地址: TW Taoyuan
- 代理机构: CKC & Partners Co., Ltd.
- 主分类号: H05K1/11
- IPC分类号: H05K1/11 ; H05K3/00 ; H05K1/02 ; H05K3/40 ; H05K1/09 ; H05K1/18
摘要:
A method for manufacturing a circuit board structure is provided. First, a first circuit layer is formed on a carrier. Then, a first dielectric layer is formed on the carrier and the first circuit layer. Thereafter, at least one first hole is formed in the first dielectric layer to expose a portion of the first circuit layer. Then, a second dielectric layer is formed on the first dielectric layer and the first circuit layer. Thereafter, at least one trench and at least one second hole are formed in the second dielectric layer, in which the trench exposes a portion of the first dielectric layer, and the second hole exposes the portion of the first circuit layer. The second hole is disposed in the first hole. Then, a metal layer is formed to fill the trench and the second hole.
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