Invention Grant
US09583709B2 Mask for forming organic layer pattern, forming method of organic layer pattern, and manufacturing method of organic light emitting diode display using the same
有权
用于形成有机层图案的掩模，有机层图案的形成方法以及使用其的有机发光二极管显示器的制造方法
- Patent Title: Mask for forming organic layer pattern, forming method of organic layer pattern, and manufacturing method of organic light emitting diode display using the same
- Patent Title (中): 用于形成有机层图案的掩模，有机层图案的形成方法以及使用其的有机发光二极管显示器的制造方法
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Application No.: US14532993Application Date: 2014-11-04
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Publication No.: US09583709B2Publication Date: 2017-02-28
- Inventor: Hyun Sung Bang , Jae Sik Kim , Yeon Hwa Lee , Joon Gu Lee , Ji Young Choung , Jin Baek Choi , Kyu Hwan Hwang , Young Woo Song
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR10-2014-0031857 20140318
- Main IPC: H01L51/00
- IPC: H01L51/00 ; G03F1/52 ; G03F7/20 ; H01L51/56
Abstract:
A mask for forming an organic layer pattern, the mask including a photomask having a first substrate and a reflecting layer on the first substrate; and a donor substrate on the photomask and separated therefrom, the donor substrate including a second substrate and an absorption part on the second substrate, wherein the photomask comprises a reflecting part configured to reflect light incident to the photomask and a light concentrating part configured to concentrate the light and transmit the light to the donor substrate.
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Information query
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