发明授权
US09588054B2 Defect inspection method, low light detecting method and low light detector
有权
缺陷检测方法,低光检测方法和低光检测器
- 专利标题: Defect inspection method, low light detecting method and low light detector
- 专利标题(中): 缺陷检测方法,低光检测方法和低光检测器
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申请号: US13882542申请日: 2011-10-14
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公开(公告)号: US09588054B2公开(公告)日: 2017-03-07
- 发明人: Yuta Urano , Toshifumi Honda , Takahiro Jingu
- 申请人: Yuta Urano , Toshifumi Honda , Takahiro Jingu
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Baker Botts L.L.P.
- 优先权: JP2010-244915 20101101
- 国际申请: PCT/JP2011/005752 WO 20111014
- 国际公布: WO2012/060057 WO 20120510
- 主分类号: G01N21/86
- IPC分类号: G01N21/86 ; H01J3/14 ; G01N21/88 ; G01N21/95 ; G01N21/956
摘要:
A defect inspection method includes an illumination light adjustment step of adjusting light emitted from a light source, an illumination intensity distribution control step of forming light flux obtained in the illumination light adjustment step into desired illumination intensity distribution, a sample scanning step of displacing a sample in a direction substantially perpendicular to a longitudinal direction of the illumination intensity distribution, a scattered light detection step of counting the number of photons of scattered light emitted from plural small areas in an area irradiated with illumination light to produce plural scattered light detection signals corresponding to the plural small areas, a defect judgment step of processing the plural scattered light detection signals to judge presence of a defect, a defect dimension judgment step of judging dimensions of the defect in each place in which the defect is judged to be present and a display step of displaying a position on sample surface and the dimensions of the defect in each place in which the defect is judged to be present.
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