Invention Grant
- Patent Title: Photomask pellicle
- Patent Title (中): 光掩模防护薄膜
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Application No.: US14724397Application Date: 2015-05-28
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Publication No.: US09588417B2Publication Date: 2017-03-07
- Inventor: Chia-Chun Chung , Chia-Hao Hsu , Chih-Tsung Shih
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03F1/62 ; G03F1/50 ; G03F1/76 ; G03F1/80

Abstract:
A method includes providing a carrier wafer, forming an indented portion on the carrier wafer, the indented portion having a sloped portion at an edge of the indented portion, bonding a pellicle wafer on the carrier wafer so as to form an open area within the indented portion, patterning the pellicle wafer to form a pellicle membrane over the indented portion and a pellicle membrane support structure over the sloped portion, and applying a mechanical force to disconnect the pellicle membrane from the pellicle wafer.
Public/Granted literature
- US20160349609A1 PHOTOMASK PELLICLE Public/Granted day:2016-12-01
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