Invention Grant
- Patent Title: Imprint lithography
- Patent Title (中): 印刷光刻
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Application No.: US12891397Application Date: 2010-09-27
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Publication No.: US09588422B2Publication Date: 2017-03-07
- Inventor: Sander Frederik Wuister
- Applicant: Sander Frederik Wuister
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B29C59/02
- IPC: B29C59/02 ; C03C25/68 ; G03F7/00 ; B29C43/02 ; B82Y10/00 ; B82Y40/00

Abstract:
A method of forming an imprint template using a substrate having an inorganic release layer and a layer of imprintable medium is disclosed. The method includes using a master imprint template to imprint a pattern into the imprintable medium, causing the imprintable medium to solidify, and etching the imprintable medium and the inorganic release layer to form a pattern in the inorganic release layer.
Public/Granted literature
- US20110076351A1 IMPRINT LITHOGRAPHY Public/Granted day:2011-03-31
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