Invention Grant
US09588422B2 Imprint lithography 有权
印刷光刻

Imprint lithography
Abstract:
A method of forming an imprint template using a substrate having an inorganic release layer and a layer of imprintable medium is disclosed. The method includes using a master imprint template to imprint a pattern into the imprintable medium, causing the imprintable medium to solidify, and etching the imprintable medium and the inorganic release layer to form a pattern in the inorganic release layer.
Public/Granted literature
Information query
Patent Agency Ranking
0/0