Invention Grant
- Patent Title: Method for transferring a useful layer
- Patent Title (中): 转移有用层的方法
-
Application No.: US14686229Application Date: 2015-04-14
-
Publication No.: US09589830B2Publication Date: 2017-03-07
- Inventor: Didier Landru , Oleg Kononchuk , Nadia Ben Mohamed , Damien Massy , Frederic Mazen , Francois Rieutord
- Applicant: Soitec , Commissariat A L'Energie Atomique et aux Energies Alternatives
- Applicant Address: FR Crolles FR Paris
- Assignee: Soitec,Commissariat A L'Energie Atomique et aux Energies Alternatives
- Current Assignee: Soitec,Commissariat A L'Energie Atomique et aux Energies Alternatives
- Current Assignee Address: FR Crolles FR Paris
- Agency: TraskBritt
- Priority: FR1453400 20140416
- Main IPC: H01L21/762
- IPC: H01L21/762 ; H01L21/683
Abstract:
A method for transferring a useful layer onto a support includes the following processes: formation of a fragilization plane through the implantation of light species into a first substrate in such a way as to form a useful layer between this plane and a surface of the first substrate; application of the support onto the surface of the first substrate to form an assembly to be fractured having two exposed sides; thermal fragilization treatment of the assembly to be fractured; and initiation and self-sustained propagation of a fracture wave in the first substrate along the fragilization plane. At least one of the sides of the assembly to be fractured is in close contact, over a contact zone, with an absorbent element suitable for capturing and dissipating acoustic vibrations emitted during the initiation and/or propagation of the fracture wave.
Public/Granted literature
- US20150303098A1 METHOD FOR TRANSFERRING A USEFUL LAYER Public/Granted day:2015-10-22
Information query
IPC分类:
