Invention Grant
- Patent Title: Method for processing a wafer and wafer structure
- Patent Title (中): 晶圆和晶圆结构处理方法
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Application No.: US14049340Application Date: 2013-10-09
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Publication No.: US09589880B2Publication Date: 2017-03-07
- Inventor: Srinivasa Reddy Yeduru , Karl Heinz Gasser , Stefan Woehlert , Karl Mayer , Francisco Javier Santos Rodriguez
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Main IPC: H01L21/04
- IPC: H01L21/04 ; H01L23/498 ; H01L21/48 ; H01L21/683 ; H01L23/00

Abstract:
A method for processing a wafer in accordance with various embodiments may include: removing wafer material from an inner portion of the wafer to form a structure at an edge region of the wafer to at least partially surround the inner portion of the wafer, and printing material into the inner portion of the wafer using the structure as a printing mask. A method for processing a wafer in accordance with various embodiments may include: providing a carrier and a wafer, the wafer having a first side and a second side opposite the first side, the first side of the wafer being attached to the carrier, the second side having a structure at an edge region of the wafer, the structure at least partially surrounding an inner portion of the wafer; and printing material onto at least a portion of the second side of the wafer.
Public/Granted literature
- US20150097294A1 METHOD FOR PROCESSING A WAFER AND WAFER STRUCTURE Public/Granted day:2015-04-09
Information query
IPC分类: