发明授权
- 专利标题: High-voltage transistor having shielding gate
- 专利标题(中): 具有屏蔽门的高电压晶体管
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申请号: US14150366申请日: 2014-01-08
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公开(公告)号: US09590052B2公开(公告)日: 2017-03-07
- 发明人: Hiroyuki Kutsukake , Kikuko Sugimae , Takeshi Kamigaichi
- 申请人: KABUSHIKI KAISHA TOSHIBA
- 申请人地址: JP Minato-ku
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Minato-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2004-239593 20040819
- 主分类号: H01L29/40
- IPC分类号: H01L29/40 ; H01L27/115 ; H01L27/105 ; H01L27/112
摘要:
A semiconductor device includes a plurality of high-voltage insulated-gate field-effect transistors arranged in a matrix form on the main surface of a semiconductor substrate and each having a gate electrode, a gate electrode contact formed on the gate electrode, and a wiring layer which is formed on the gate electrode contacts adjacent in a gate-width direction to electrically connect the gate electrodes arranged in the gate-width direction. And the device includes shielding gates provided on portions of an element isolation region which lie between the transistors adjacent in the gate-width direction and gate-length direction and used to apply reference potential or potential of a polarity different from that of potential applied to the gate of the transistor to turn on the current path of the transistor to the element isolation region.
公开/授权文献
- US20140117458A1 HIGH-VOLTAGE TRANSISTOR HAVING SHIELDING GATE 公开/授权日:2014-05-01
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