Invention Grant
US09593410B2 Methods and apparatus for stable substrate processing with multiple RF power supplies
有权
使用多个RF电源进行稳定的基板处理的方法和装置
- Patent Title: Methods and apparatus for stable substrate processing with multiple RF power supplies
- Patent Title (中): 使用多个RF电源进行稳定的基板处理的方法和装置
-
Application No.: US13785880Application Date: 2013-03-05
-
Publication No.: US09593410B2Publication Date: 2017-03-14
- Inventor: Zhenbin Ge , Alan A. Ritchie
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C25B11/00 ; C25B13/00 ; C23C14/34 ; C23C14/35 ; H01J37/32 ; H01J37/34
Abstract:
Methods and apparatus for processing substrates are provided herein. In some embodiments, a physical vapor deposition chamber includes a first RF power supply having a first base frequency and coupled to one of a target or a substrate support; and a second RF power supply having a second base frequency and coupled to one of the target or the substrate support, wherein the first and second base frequencies are integral multiples of each other, wherein the second base frequency is modified to an offset second base frequency that is not an integral multiple of the first base frequency.
Public/Granted literature
- US20140251788A1 METHODS AND APPARATUS FOR STABLE SUBSTRATE PROCESSING WITH MULTIPLE RF POWER SUPPLIES Public/Granted day:2014-09-11
Information query
IPC分类:
