- 专利标题: Illumination optical system, exposure apparatus, device production method, and light polarization unit
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申请号: US14124034申请日: 2011-11-25
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公开(公告)号: US09599905B2公开(公告)日: 2017-03-21
- 发明人: Osamu Tanitsu , Hirohisa Tanaka , Kinya Kato , Takashi Mori
- 申请人: Osamu Tanitsu , Hirohisa Tanaka , Kinya Kato , Takashi Mori
- 申请人地址: JP Tokyo
- 专利权人: NIKON CORPORATION
- 当前专利权人: NIKON CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 国际申请: PCT/JP2011/077200 WO 20111125
- 国际公布: WO2012/169089 WO 20121213
- 主分类号: G03B27/72
- IPC分类号: G03B27/72 ; G03F7/20 ; G02B26/08 ; G02B27/28 ; G03F7/00
摘要:
An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.
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