- 专利标题: Optoelectronic device and method for manufacturing the same
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申请号: US14591772申请日: 2015-01-07
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公开(公告)号: US09601655B2公开(公告)日: 2017-03-21
- 发明人: Jia-Kuen Wang , Chao-Hsing Chen
- 申请人: EPISTAR CORPORATION
- 申请人地址: TW Hsinchu
- 专利权人: EPISTAR CORPORATION
- 当前专利权人: EPISTAR CORPORATION
- 当前专利权人地址: TW Hsinchu
- 代理机构: Patterson + Sheridan, LLP
- 优先权: TW103100593A 20140107
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L33/36 ; H01L33/38 ; H01L33/40 ; H01L33/44
摘要:
An optoelectronic device comprises a semiconductor stack, wherein the semiconductor stack comprises a first semiconductor layer, an active layer formed on the first semiconductor layer, and a second semiconductor layer formed on the active layer; an electrode formed on the second semiconductor layer, wherein the first electrode further comprises a reflective layer; and an insulative layer formed on the second semiconductor layer, and a space formed between the first electrode and the insulative layer.
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