Invention Grant
- Patent Title: Method for atomic layer deposition
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Application No.: US14917566Application Date: 2014-09-12
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Publication No.: US09605344B2Publication Date: 2017-03-28
- Inventor: Ying-Bing Jiang , Joseph L. Cecchi , Yaqin Fu , C. Jeffrey Brinker
- Applicant: STC.UNM
- Applicant Address: US NM Albuquerque
- Assignee: STC.UNM
- Current Assignee: STC.UNM
- Current Assignee Address: US NM Albuquerque
- Agency: MH2 Technology Law Group, LLP
- International Application: PCT/US2014/055430 WO 20140912
- International Announcement: WO2015/038919 WO 20150319
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/46

Abstract:
An atomic layer deposition method is disclosed for preparing polypeptides. The method comprises providing a solid-phase support comprising a reactive amine monolayer in an atomic layer deposition (ALD) chamber. The solid-phase support is contacted with a first protected amino acid substituted with a protecting group by atomic layer deposition, wherein the protecting group is bonded to a non-side chain amino group of the protected amino acid. A carboxylic acid group of the first protected amino acid is reacted with the reactive amine monolayer, thereby coupling the first protected amino acid to the solid-phase support to produce a coupled-product.
Public/Granted literature
- US20160222512A1 METHOD FOR ATOMIC LAYER DEPOSITION Public/Granted day:2016-08-04
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