- 专利标题: Magnetic field generation apparatus and sputtering apparatus
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申请号: US14319638申请日: 2014-06-30
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公开(公告)号: US09607813B2公开(公告)日: 2017-03-28
- 发明人: Jun Sasaki , Atsuhiro Abe , Ryoichi Hiratsuka
- 申请人: Sony Corporation
- 申请人地址: JP Tokyo
- 专利权人: SONY CORPORATION
- 当前专利权人: SONY CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Dentons US LLP
- 优先权: JP2013-145204 20130711
- 主分类号: H01J37/34
- IPC分类号: H01J37/34 ; C23C14/35 ; H01F7/02
摘要:
Provided is a magnetic field generation apparatus including: two or more main magnetic pole portions configured to generate a main magnetic field; one or more secondary magnetic pole portions including a plurality of first divisional magnets obtained by a division, that generate a secondary magnetic field for adjusting the generated main magnetic field; and a yoke portion including one or more first yokes opposing the plurality of first divisional magnets in correspondence with the one or more secondary magnetic pole portions.
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