Invention Grant
- Patent Title: Method and system for design of enhanced edge slope patterns for charged particle beam lithography
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Application No.: US15068516Application Date: 2016-03-11
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Publication No.: US09612530B2Publication Date: 2017-04-04
- Inventor: Akira Fujimura , Kazuyuki Hagiwara , Stephen F. Meier , Ingo Bork
- Applicant: D2S, Inc.
- Applicant Address: US CA San Jose
- Assignee: D2S, Inc.
- Current Assignee: D2S, Inc.
- Current Assignee Address: US CA San Jose
- Agency: The Mueller Law Office, P.C.
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/70 ; G03F7/20
Abstract:
A method and system for fracturing or mask data preparation are presented in which a set of shots is determined for a multi-beam charged particle beam writer. The edge slope of a pattern formed by the set of shots is calculated. An edge of the pattern which has an edge slope below a target level is identified, and the dosage of a beamlet in a shot in the set of shots is increased to improve the edge slope. The improved edge slope remains less than the target level.
Public/Granted literature
- US20160195805A1 Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam Lithography Public/Granted day:2016-07-07
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