Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US14830508Application Date: 2015-08-19
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Publication No.: US09620681B2Publication Date: 2017-04-11
- Inventor: Hwankuk Yuh
- Applicant: LG Electronics Inc.
- Applicant Address: KR Seoul
- Assignee: LG ELECTRONICS INC.
- Current Assignee: LG ELECTRONICS INC.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2014-0135207 20141007
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/38 ; H01L33/20 ; H01L29/40 ; H01L33/42

Abstract:
A semiconductor device including a first conductivity type semiconductor layer, an active layer, and a second conductivity type semiconductor layer which are sequentially stacked; a first conductivity type upper electrode portion and a first conductivity type lower electrode portion disposed to correspond to each other with the first conductivity type semiconductor layer interposed therebetween; a second conductivity type upper electrode portion and a second conductivity type lower electrode portion disposed to correspond to each other with the first and second conductivity type semiconductor layers interposed therebetween; and a second conductivity type electrode connection portion electrically connecting the second conductivity type upper electrode portion and the second conductivity type lower electrode portion.
Public/Granted literature
- US20160099383A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2016-04-07
Information query
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