Invention Grant
- Patent Title: Gate control device, semiconductor device, and method for controlling semiconductor device
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Application No.: US14824228Application Date: 2015-08-12
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Publication No.: US09621153B2Publication Date: 2017-04-11
- Inventor: Kentaro Ikeda , Masahiko Kuraguchi
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-192014 20140919
- Main IPC: H03B1/00
- IPC: H03B1/00 ; H03K3/01 ; H03K17/687 ; H01L29/778 ; H01L29/20 ; H03K17/0412 ; H03K17/06 ; H03K17/16 ; H01L29/10

Abstract:
A semiconductor device according to an embodiments controls a gate voltage to be applied to a gate electrode of a junction field effect transistor including a source electrode, a drain electrode, and the gate electrode, the transistor having a first threshold voltage at which the transistor is turned on, and a second threshold at which conductivity modulation occurs in the transistor so as to make the gate voltage equal to or higher than the second threshold voltage when a forward current in a direction from the drain electrode toward the source electrode flows, and so as to make the time variation in gate voltage have a point from which the rate of the time variation starts decreasing at a voltage between the second threshold voltage and the first threshold voltage when the forward current to be shut down.
Public/Granted literature
- US20160087625A1 GATE CONTROL DEVICE, SEMICONDUCTOR DEVICE, AND METHOD FOR CONTROLLING SEMICONDUCTOR DEVICE Public/Granted day:2016-03-24
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