Invention Grant
- Patent Title: Porous metallic membrane
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Application No.: US14654768Application Date: 2013-12-23
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Publication No.: US09636639B2Publication Date: 2017-05-02
- Inventor: Kambiz Ansari , Shilin Chen , Christina Yuan Ling Tan , Isabel Rodriguez
- Applicant: Agency for Science, Technology and Research
- Applicant Address: SG Singapore
- Assignee: Agency for Science, Technology and Research
- Current Assignee: Agency for Science, Technology and Research
- Current Assignee Address: SG Singapore
- Agency: Schwegman Lundberg & Woessner, P.A.
- Priority: SG201209493-4 20121221
- International Application: PCT/SG2013/000546 WO 20131223
- International Announcement: WO2014/098774 WO 20140626
- Main IPC: B01D39/00
- IPC: B01D39/00 ; B01D39/14 ; B01D67/00 ; B01D71/02 ; B01D69/06 ; B01D53/22 ; B01D61/02 ; B01D61/14 ; B01D69/02 ; B01D69/10 ; C25D1/08 ; C25D3/12 ; C25D5/00 ; C25D5/02 ; C25D7/12

Abstract:
The present disclosure relates to a method of forming a metallic layer having pores extending therethrough, the method comprising the steps of: (a) contacting a cathode substrate with an electrolyte solution comprising at least one cation; reducing the cation to deposit the metallic layer on a surface of the cathode substrate; and (c) generating a plurality of non-conductive regions on the cathode substrate surface during reducing step (b); wherein the deposition of the metallic layer is substantially prevented on the non-conductive regions on the cathode substrate surface to thereby form pores extending through the deposited metallic layer. The present disclosure further provides a metallic porous membrane fabricated by the disclosed process.
Public/Granted literature
- US20150343390A1 POROUS METALLIC MEMBRANE Public/Granted day:2015-12-03
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