Invention Grant
- Patent Title: Plasma source for a focused ion beam system
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Application No.: US14481642Application Date: 2014-09-09
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Publication No.: US09640367B2Publication Date: 2017-05-02
- Inventor: John Keller , Noel Smith , Roderick Boswell , Lawrence Scipioni , Christine Charles , Orson Sutherland
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, P.C.
- Agent John B. Kelly
- Main IPC: H01J37/04
- IPC: H01J37/04 ; H01J37/32 ; H01J27/16 ; H01J37/08 ; H01J37/24
Abstract:
The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
Public/Granted literature
- US20150130348A1 Magnetically Enhanced, Inductively coupled Plasma Source For a Focused Ion Beam System Public/Granted day:2015-05-14
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