Invention Grant
- Patent Title: Structured illumination for contrast enhancement in overlay metrology
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Application No.: US14794294Application Date: 2015-07-08
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Publication No.: US09645079B2Publication Date: 2017-05-09
- Inventor: Joel Seligson , Noam Sapiens , Daniel Kandel
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01B11/14
- IPC: G01B11/14 ; G01N21/47 ; G03F7/20 ; G01B11/02 ; G01N21/00

Abstract:
Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.
Public/Granted literature
- US20160003735A1 Structured Illumination for Contrast Enhancement in Overlay Metrology Public/Granted day:2016-01-07
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