Invention Grant
- Patent Title: Multilayer structure in an integrated circuit for damage prevention and detection and methods of creating the same
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Application No.: US15090996Application Date: 2016-04-05
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Publication No.: US09646939B2Publication Date: 2017-05-09
- Inventor: John H. Zhang , Lawrence A. Clevenger , Carl Radens , Yiheng Xu , Byoung Youp Kim , Walter Kleemeier
- Applicant: International Business Machines Corporation , STMicroelectronics, Inc.
- Applicant Address: US NY Armonk US TX Coppell
- Assignee: International Business Machines Corporation,STMicroelectronics, Inc.
- Current Assignee: International Business Machines Corporation,STMicroelectronics, Inc.
- Current Assignee Address: US NY Armonk US TX Coppell
- Agency: Law Offices of Ira D. Blecker, P.C.
- Main IPC: H01L21/4763
- IPC: H01L21/4763 ; H01L23/00 ; H01L21/768 ; H01L21/66 ; H01L23/528 ; H01L23/532 ; H01L23/522

Abstract:
Various embodiments facilitate die protection for an integrated circuit. In one embodiment, a multilayer structure is formed in multiple levels and along the edges of a die to prevent and detect damages to the die. The multilayer structure includes a support layer, a first plurality of dielectric pillars overlying the support layer, a metal layer that fills spaces between the first plurality of dielectric pillars, an insulation layer overlying the first plurality of dielectric pillars and the metal layer, a second plurality of dielectric pillars overlying the insulation layer, and a second metal layer that fills spaces between the second plurality of dielectric pillars.
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Information query
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